Core Technology


Super hard   tough   dense   solid   smooth

 

High ionization rate, high ion density, low deposition defects
Gentle and thorough plasma cleaning technology / advanced plasma source
Multi-mode electromagnetic controllable arc source technology / high ionization rate magnetron sputtering technology
Up to four target material components, achieving various composite coating processes
Reasonably distributed plasma, achieving large area uniform deposition
One-click start, ensuring process stability
Unique plasma enhancement and acceleration system, unique particle refinement technology
High film hardness, low stress, strong adhesion, smooth surface

 

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