Core Technology
Super hard tough dense solid smooth
High ionization rate, high ion density, low deposition defects Gentle and thorough plasma cleaning technology / advanced plasma source Multi-mode electromagnetic controllable arc source technology / high ionization rate magnetron sputtering technology Up to four target material components, achieving various composite coating processes Reasonably distributed plasma, achieving large area uniform deposition One-click start, ensuring process stability Unique plasma enhancement and acceleration system, unique particle refinement technology High film hardness, low stress, strong adhesion, smooth surface |
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